Počet záznamů: 1
Surface stoichiometry and depth profile of Ti.sub.x./sub.-Cu.sub.y./sub.N.sub.z./sub. thin films deposited by magnetron sputtering
SYS 0552187 LBL 01000a^^22220027750^450 005 20231122150313.7 014 $a 85108311702 $2 SCOPUS 014 $a 000667019900001 $2 WOS 017 $a 10.3390/ma14123191 $2 DOI 100 $a 20220121d m y slo 03 ba 101 $a eng 102 $a CH 200 1-
$a Surface stoichiometry and depth profile of Tix-CuyNz thin films deposited by magnetron sputtering 215 $a 14 s. 463 -1
$1 001 cav_un_epca*0378436 $1 011 $e 1996-1944 $1 200 1 $a Materials $v Roč. 14, č. 12 (2021) $1 205 $a ONLINE $1 210 $c MDPI 610 $a magnetron sputtering 610 $a Ti-Cu-N coating 610 $a N incorporation 610 $a X-ray photoelectron spectroscopy 610 $a X-ray diffraction 610 $a transmission electron microscopy 700 -1
$3 cav_un_auth*0422668 $a Mukhopadhyay $b A.K. $y IN 701 -1
$3 cav_un_auth*0052829 $a Roy $b A. $y IN 701 -1
$3 cav_un_auth*0422669 $a Bhattacharjee $b G. $y IN 701 -1
$3 cav_un_auth*0422670 $a Das $b S.C. $y IN 701 -1
$3 cav_un_auth*0422671 $a Majumdar $b A. $y IN 701 -1
$3 cav_un_auth*0257508 $a Wulff $b H. $y DE 701 -1
$3 cav_un_auth*0375512 $a Hippler $b Rainer $p FZU-D $i Nízkoteplotní plazma $j Low-Temperature Plasma $w Low-Temperature Plasma $y DE $z K $T Fyzikální ústav AV ČR, v. v. i. 856 $u http://hdl.handle.net/11104/0327392 $9 RIV
Počet záznamů: 1