Počet záznamů: 1
Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering
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$a Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering 215 $a 10 s. 463 -1
$1 001 cav_un_epca*0257155 $1 011 $a 0734-2101 $e 1520-8559 $1 200 1 $a Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films $v Roč. 34, č. 4 (2016), 1-10 $1 210 $c AIP Publishing 610 $a radiofrequency current 610 $a voltage measurements 610 $a energy-distributions 610 $a sheath voltages 610 $a deposition 610 $a density 610 $a hysteresis 610 $a discharges 610 $a films 610 $a technology 700 -1
$3 cav_un_auth*0302435 $a Lundin $b D. $y FR 701 -1
$3 cav_un_auth*0100168 $a Čada $b Martin $i Nízkoteplotní plazma $j Low-Temperature Plasma $p FZU-D $w Low-Temperature Plasma $T Fyzikální ústav AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0100245 $a Hubička $b Zdeněk $i Nízkoteplotní plazma $j Low-Temperature Plasma $p FZU-D $w Low-Temperature Plasma $T Fyzikální ústav AV ČR, v. v. i.
Počet záznamů: 1