Počet záznamů: 1
Conjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes
SYS 0341918 LBL 01907^^^^^2200301^^^450 005 20240103193407.5 014 $a 000276538900001 $2 WOS 017 7-
$a 10.2320/matertrans.MC200925 $2 DOI 100 $a 20100408d m y slo 03 ba 101 0-
$a eng $d eng 102 $a JP 200 1-
$a Conjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes 215 $a 5 s. 463 -1
$1 001 cav_un_epca*0255972 $1 011 $a 1345-9678 $e 1347-5320 $1 200 1 $a Materials Transactions $v Roč. 51, č. 2 (2010), s. 197-201 $1 210 $c Japan Institute of Metals and Materials 610 0-
$a ultra violet degradability 610 0-
$a polysilylenes 610 0-
$a weak bond 610 0-
$a conformation defect 610 0-
$a nanorezists 700 -1
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$3 cav_un_auth*0017458 $a Kuřitka $b I. $y CZ $4 070 701 -1
$3 cav_un_auth*0258053 $a Hua $b B. $y CN $4 070
Počet záznamů: 1