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Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
- 1.Hubička, Z., Zlámal, M., Čada, M., Kment, Š., Krysa, J. Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering. Catalysis Today. 2019, 328(May), 29-34. ISSN 0920-5861. E-ISSN 1873-4308. Dostupné z: doi: 10.1016/j.cattod.2018.11.034.
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