Double hollow cathode plasma jet-low temperature method for the TiO.sub.2-x./sub.N.sub.x./sub. photoresponding films

Kment, Š., Klusoň, P., Hubička, Z., Krýsa, J., Čada, M., Gregora, I., Deyneka, A., Remeš, Z., Žabová, H., Jastrabík, L. Double hollow cathode plasma jet-low temperature method for the TiO_2-xN_x photoresponding films. Electrochimica acta. 2010, 55(5), 1548-1556. ISSN 0013-4686. E-ISSN 1873-3859. Dostupné z: doi: 10.1016/j.electacta.2009.10.017