Surface stoichiometry and depth profile of Ti.sub.x./sub.-Cu.sub.y./sub.N.sub.z./sub. thin films deposited by magnetron sputtering

MUKHOPADHYAY, A.K., ROY, A., BHATTACHARJEE, G., DAS, S.C., MAJUMDAR, A., WULFF, H., HIPPLER, R. Surface stoichiometry and depth profile of Ti_x-Cu_yN_z thin films deposited by magnetron sputtering. Materials. 2021, 14(12), 3191. E-ISSN 1996-1944. Dostupné z: doi: 10.3390/ma14123191.