Počet záznamů: 1
Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering
- 1.HUBIČKA, Z., ZLÁMAL, M., ČADA, M., KMENT, Š., KRYSA, J. Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering. Catalysis Today. 2019, 328(May), 29-34. ISSN 0920-5861. E-ISSN 1873-4308. Dostupné z: doi: 10.1016/j.cattod.2018.11.034.
Počet záznamů: 1