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High-rate reactive deposition of transparent SiO.sub.2./sub. films containing low amount of Zr from molten magnetron target
- 1.MUSIL, J., SATAVA, V., BAROCH, P. High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target. Thin Solid Films. 2010, 519(2), 775-777. ISSN 0040-6090. E-ISSN 1879-2731. Dostupné z: doi: 10.1016/j.tsf.2010.09.009
Počet záznamů: 1