Effect of nitrogen doping on TiO.sub.x./sub.N.sub.y./sub. thin film formation at reactive high-power pulsed magnetron sputtering

STRAŇÁK, V., QUAAS, M., BOGDANOWICZ, R., STEFFEN, H., WULFF, H., HUBIČKA, Z., TICHÝ, M., HIPPLER, R. Effect of nitrogen doping on TiO_xN_y thin film formation at reactive high-power pulsed magnetron sputtering. Journal of Physics D-Applied Physics. 2010, 43(28), 1-7. ISSN 0022-3727. E-ISSN 1361-6463. Dostupné z: doi: 10.1088/0022-3727/43/28/285203.