Double hollow cathode plasma jet-low temperature method for the TiO.sub.2-x./sub.N.sub.x./sub. photoresponding films

KMENT, Š., KLUSOŇ, P., HUBIČKA, Z., KRÝSA, J., ČADA, M., GREGORA, I., DEYNEKA, A., REMEŠ, Z., ŽABOVÁ, H., JASTRABÍK, L. Double hollow cathode plasma jet-low temperature method for the TiO_2-xN_x photoresponding films. Electrochimica acta. 2010, 55(5), 1548-1556. ISSN 0013-4686. E-ISSN 1873-3859. Dostupné z: doi: 10.1016/j.electacta.2009.10.017