Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

KHORSAND, A.R., SOBIERAJSKI, R., LOUIS, E., BRUIJN, S., VAN HATTUM, E.D., VAN DE KRUIJS, R.W.E., JUREK, M., KLINGER, D., PELKA, J. B., JUHA, L., BURIAN, T., CHALUPSKÝ, J., CIHELKA, J., HÁJKOVÁ, V., VYŠÍN, L., JASTROW, U., STOJANOVIC, N., TOLEIKIS, S., WABNITZ, H., TIEDTKE, K., SOKOLOWSKI-TINTEN, K., SHYMANOVICH, U., KRZYWINSKI, J., HAU-RIEGE, S., LONDON, R., GLEESON, A., GULLIKSON, E.M., BIJKERK, F. Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure. Optics Express. 2010, 18(2), 700-712. ISSN 1094-4087. Dostupné z: doi: 10.1364/OE.18.000700