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Conjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes
- 1.SCHAUER, F., SCHAUER, P., KUŘITKA, I., HUA, B. Conjugated Silicon–Based Polymer Resists for Nanotechnologies: EB and UV Meditated Degradation Processes in Polysilanes. Materials Transactions. 2010, 51(2), 197-201. ISSN 1345-9678. E-ISSN 1347-5320. Dostupné z: doi: 10.2320/matertrans.MC200925
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