Počet záznamů: 1
On the origin of the differences in the Cu K-edge XANES of isostructural and isoelectronic compounds
- 1.ŠIPR, O., ROCCA, F., FORNASINI, P. On the origin of the differences in the Cu K-edge XANES of isostructural and isoelectronic compounds. Journal of Physics-Condensed Matter. 2009, 21(25), 255401/1-255401/9. ISSN 0953-8984. E-ISSN 1361-648X. Dostupné z: doi: 10.1088/0953-8984/21/25/255401
Počet záznamů: 1