AFM nanometrology interferometric system with the compensation of angle errors

0367516 - ÚPT 2012 RIV US eng C - Konferenční příspěvek (zahraniční konf.)
Hrabina, Jan - Lazar, Josef - Klapetek, P. - Číp, Ondřej
AFM nanometrology interferometric system with the compensation of angle errors.
Optical Measurement Systems for Industrial Inspection VII (Proceedings of SPIE Vol. 8082). Bellingham: SPIE, 2011, 80823U:1-6. ISBN 978-0-8194-8678-3.
[Optical Measurement Systems for Industrial Inspection VII. Munich (DE), 23.05.2011-26.05.2011]
Grant CEP: GA MŠMT(CZ) LC06007; GA MŠMT 2C06012; GA MPO 2A-1TP1/127; GA MPO FT-TA3/133; GA MPO 2A-3TP1/113; GA ČR GA102/09/1276; GA ČR GA102/07/1179
Výzkumný záměr: CEZ:AV0Z20650511
Klíčová slova: atomic force microscopy (AFM) * nanometrology * nanoscale * nanopositioning * interferometry * abbe errors
Kód oboru RIV: BH - Optika, masery a lasery

The contribution is oriented towards measuring in the nanoscale through local probe microscopy techniques, primarily the AFM microscopy. The need to make the AFM microscope a nanometrology tool not only the positioning of the tip has to be based on precise measurements but the traceability of the measuring technique has to be ensured up to the primary standard. This leads to the engagement of laser interferometric measuring methods. We present a improved design of the six-axes dimensional interferometric measurement tool for local probe microscopy stage nanopositioning with the compensation system of angle errors. The setup is powered with the help of a single-frequency frequency-doubled Nd:YAG laser which is stabilized by thermal frequency control locked to a Doppler-broadened absorption line in iodine. The laser stabilization technique is described together with comparison of frequency stability and angle errors compensation system performance.
Trvalý link: http://hdl.handle.net/11104/0202169