Fabrication of nanostructured aluminium thin film and in-situ monitoring of the growth

0351617 - FZÚ 2011 RIV US eng C - Konferenční příspěvek (zahraniční konf.)
Novotný, Michal - Bulíř, Jiří - Lančok, Ján - Pokorný, Petr - Bodnár, Michal - Piksová, K.
Fabrication of nanostructured aluminium thin film and in-situ monitoring of the growth.
Nanostructured Thin Films III. Bellingham: SPIE, 2010 - (Martin-Palma, R.; Jen, Y.; Lakhtakia, A.), 7766OU/1-7766OU/8. Proceedings of SPIE, 7766. ISBN 9780819482624. ISSN 0277-786x.
[Nanostructured Thin Films III. San Diego (US), 04.08.2010-05.08.2010]
Grant CEP: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324; GA AV ČR IAA100100729
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: aluminium ultra thin film * magnetron sputtering * in-situ monitoring * electrical conductivity * spectral ellipsometry * optical emission spectroscopy
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
http://dx.doi.org/10.1117/12.860555

Ultrathin nanostructured metal films exhibit unusual properties and performances. Film functional properties depend strongly on the nanostructure that can be manipulated by varying nucleation and growth conditions. Hence, in order to control the nanostructure of aluminium thin film fabricated by RF magnetron sputtering, we focus on in-situ monitoring of electrical and optical properties of the growing layer as well as plasma characterization by mass and optical emission spectroscopy. The electrical conductivity and I-V characteristics were measured. The optical constants were obtained from optical monitoring based on a spectral ellipsometry. The relevant models (based on one or two Lorentz oscillators and B-spline function) are suggested to evaluate the data obtained from the monitoring techniques. The results of the in-situ monitoring are correlated with SEM analyses. We demonstrate the monitoring can distinguish the growth mode in the real-time.
Trvalý link: http://hdl.handle.net/11104/0191329