Imaging of thermal treated thin films on silicon substrate in the scanning low energy electron microscope

0350672 - ÚPT 2011 RIV CZ eng C - Konferenční příspěvek (zahraniční konf.)
Zobačová, Jitka - Mikmeková, Šárka - Polčák, J. - Frank, Luděk
Imaging of thermal treated thin films on silicon substrate in the scanning low energy electron microscope.
Proceedings of the 12th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation. Brno: Institute of Scientific Instruments AS CR, v.v.i, 2010 - (Mika, F.), s. 69-70. ISBN 978-80-254-6842-5.
[International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation /12./. Skalský dvůr (CZ), 31.05.2010-04.06.2010]
Grant CEP: GA AV ČR IAA100650803
Výzkumný záměr: CEZ:AV0Z20650511
Klíčová slova: thin films * SLEEM * Si substrate
Kód oboru RIV: JA - Elektronika a optoelektronika, elektrotechnika
http://arl-repository.lib.cas.cz/uloziste_av/UPT-D/cav_un_epca-0350672_01.pdf

Structure of thin films usually requires to be examined on microscopic level. The research topics like growth and stability of thin films, phase transitions and separation, crystallization, diffusion and defect formation has a need for LEED or XPS as techniques adequate for investigation of atomic transport processes on short length scales. The low energy electron microscopy is a complementary solution for imaging of samples with special concern for knowledge of surface physics and material science. In this contribution the microscopic examination of as-deposited and thermal treated thin films on Si substrates is performed.
Trvalý link: http://hdl.handle.net/11104/0190612