Počet záznamů: 1
Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system
- 1.0367262 - FZÚ 2012 RIV CH eng J - Článek v odborném periodiku
Straňák, V. - Block, S. - Drache, S. - Hubička, Zdeněk - Helm, Ch.A. - Jastrabík, Lubomír - Tichý, M. - Hippler, R.
Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system.
Surface and Coatings Technology. Roč. 205, 8-9 (2011), s. 2755-2762. ISSN 0257-8972
Grant CEP: GA AV ČR KAN301370701; GA AV ČR KJB100100805; GA MŠMT(CZ) 1M06002
Grant ostatní: AVČR(CZ) M100100915
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: Cu cluster growth * pulsed magnetron sputtering * cluster mass- and size- distribution * AFM
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.867, rok: 2011
Size-controlled Cu clusters are formed in a system which combines pulsed magnetron sputtering and gas condensation at room temperature. The discharge repetition frequency (0.1–25 kHz) and the duty cycles (20–90%) of the magnetron sputtering are varied systematically, the influence of discharge current (100–800 mA) and the pressure in the condensation tube (25–90 Pa) is also investigated. For all preparation conditions, the cluster mass shows a lognormal distribution. A non-monotonic frequency dependence with a maximum at 1 kHz and 20% of duty cycle is observed (about 105amu, or cluster diameter 8–10 nm). By adjusting discharge frequency and duty cycle, the cluster mass can be decreased by one order of magnitude. We suggest that this effect is caused by energy dissipated into the aggregation tube; and find a critical buffer gas temperature Tg-cr which limits cluster growth.
Trvalý link: http://hdl.handle.net/11104/0202005
Počet záznamů: 1