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Chapter 8: Preparation and Characterization of TiO(2)-Based Photocatalysts by Chemical Vapour Deposition

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    0361557 - ÚCHP 2012 RIV NL eng C - Konferenční příspěvek (zahraniční konf.)
    Nacevski, G. - Marinkovski, M. - Tomovska, R. - Fajgar, Radek
    Chapter 8: Preparation and Characterization of TiO(2)-Based Photocatalysts by Chemical Vapour Deposition.
    Nanotechnological Basis for Advanced Sensors. Dordrecht: Springer Science, 2011 - (Reithmaier, J.; Paunovic, P.; Kulisch, W.; Popov, C.; Petkov, P.), s. 65-71. NATO Science for Peace and Security Series - B:, Physics and Biophysics. ISBN 978-94-007-0902-7. ISSN 1871-465X.
    [NATO-Advanced-Study-Institute Conference on Nanotechnological Basis for Advanced Sensors. Sozopol (BG), 30.05.2010-11.06.2010]
    Výzkumný záměr: CEZ:AV0Z40720504
    Klíčová slova: TiO(2)-based photocatalysts * TiO(2)/SiO(2) mixed oxides * laser induced CVD
    Kód oboru RIV: CF - Fyzikální chemie a teoretická chemie
    http://arl-repository.lib.cas.cz/nusl/UCHP-M/cav_un_epca-0361557_01.pdf

    In the present work, a novel technique for the preparation of TiO(2)-based photocatalysts modified with SiO(2) is presented, using a pulsed ArF laser to induce a chemical vapor deposition process. The irradiated gas mixture was composed of TiCl(4)/SiCl(4) precursors in excess of oxygen. Laser irradiation at 193 nm with a repetition frequency of 10 Hz induced the deposition of thin nano-sized mixed oxide films. The main aim was to find the best conditions for the production of highly photoactive catalysts and to decrease deactivation processes during the photo-oxidation. The composition, structure and morphology of the oxide catalysts prepared were studied by various spectroscopies, electron microscopy and diffraction techniques.
    Trvalý link: http://hdl.handle.net/11104/0198849

     
     
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