Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina

0351378 - FZÚ 2011 RIV DE eng J - Článek v odborném periodiku
Pokorný, Petr - Bulíř, Jiří - Lančok, Ján - Musil, Jindřich - Novotný, Michal
Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina.
Plasma Processes and Polymers. Roč. 7, č. 11 (2010), s. 910-914. ISSN 1612-8850. E-ISSN 1612-8869
Grant CEP: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: aluminium oxide * ion-energy distribution function * magnetron * mass spectrometry * pulsed discharges
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.643, rok: 2010

The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate φO2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates φO2=φAr. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films.
Trvalý link: http://hdl.handle.net/11104/0191144