Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide

0343204 - FZÚ 2011 RIV RO eng J - Článek v odborném periodiku
Novotný, Michal - Bulíř, Jiří - Pokorný, Petr - Bočan, Jiří - Fitl, Přemysl - Lančok, Ján - Musil, Jindřich
Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide.
Journal of Optoelectronics and Advanced Materials. Roč. 12, č. 3 (2010), 697-700. ISSN 1454-4164. E-ISSN 1841-7132
Grant CEP: GA AV ČR IAA100100718; GA AV ČR KAN400100653; GA ČR GP202/09/P324
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: reactive magnetron sputtering * alumina * plasma spectroscopy * mass spectroscopy * optical emission spectroscopy
Kód oboru RIV: BH - Optika, masery a lasery
Impakt faktor: 0.412, rok: 2010

Optical emission spectroscopy (OES) and mass spectrometry were used for plasma investigation of DC pulsed reactive magnetron sputtering of aluminium oxide. Aluminium target was sputtered in a reactive oxygen/argon atmosphere. Special attention was paid to the transition from the dielectric to metallic mode. Mass spectra were recorded at the substrate. OES spectra were taken at the target and at the substrate. Both mass and emission spectra obtained in the transition mode revealed distinct changes in plasma composition (O, O2, Al and AlO plasma species and corresponding positive ions). The transition from the dielectric to metallic mode is followed by a decrease of atomic oxygen intensity, while the intensity of aluminium species increases. AlO molecule appeared in the mass spectra only.
Trvalý link: http://hdl.handle.net/11104/0005901