Počet záznamů: 1
Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds
- 1.Zajíčková, L. - Janča, J. - Peřina, Vratislav
Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds.
Thin Solid Films. Roč. 338, - (1999), s. 49-59. ISSN 0040-6090. E-ISSN 1879-2731
Impakt faktor: 1.101, rok: 1999
http://hdl.handle.net/11104/0081539
Počet záznamů: 1