Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits

Name: Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits
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Kulas, J.; Roušar, I.; Krýsa, J.; Jirkovský, Jaromír

Počet záznamů: 1

Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO.sub.2./sub. Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits

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SYSNO ASEP	0180739
Document Type	J - Journal Article
R&D Document Type	Journal Article
Subsidiary J	Ostatní články
Title	Photocatalytic Degradation Rate of Oxalic Acid on the Semiconductive Layer of n-TiO₂ Particles in the Batch Mode Plate Reactor. Part I: Mass Transfer Limits
Author(s)	Kulas, J. (CZ) Roušar, I. (CZ) Krýsa, J. (CZ) Jirkovský, Jaromír (UFCH-W)_RID
Source Title	Journal of Applied Electrochemistry. - : SPRINGER - ISSN 0021-891X Roč. 28, č. 8 (1998), s. 843-853
Language	eng - English
Country	GB - United Kingdom
Subject RIV	CF - Physical ; Theoretical Chemistry CF - Physical ; Theoretical Chemistry
R&D Projects	GA203/96/0883 GA ČR - Czech Science Foundation (CSF)
Workplace	J. Heyrovsky Institute of Physical Chemistry
Contact	Michaela Knapová, michaela.knapova@jh-inst.cas.cz, Tel.: 266 053 196
Year of Publishing	2000

Počet záznamů: 1