Ouchi, A. - Koga, Y. - Bastl, Zdeněk - Pola, Josef
UV-Laser-Induced Photolysis of Trimethyl(vinyloxy)silane for Chemical Vapour Deposition of Polysiloxane Films.
Applied Organometallic Chemistry. Roč. 13, - (1999), s. 643-647. ISSN 0268-2605. E-ISSN 1099-0739
Grant CEP: GA ČR GA203/96/1217
Impakt faktor: 1.270, rok: 1999
http://hdl.handle.net/11104/0077340