CN.sub.x./sub.H.sub.y./sub. films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism

Name: CN.sub.x./sub.H.sub.y./sub. films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism
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Shaginyan, L. R.; Fendrych, František; Jastrabík, Lubomír; Soukup, Ladislav; Kulikovsky, V. Yu.; Musil, Jindřich

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CN.sub.x./sub.H.sub.y./sub. films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism

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Shaginyan, L. R. - Fendrych, František - Jastrabík, Lubomír - Soukup, Ladislav - Kulikovsky, V. Yu. - Musil, Jindřich
CN_xH_y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism.
Surface and Coatings Technology. 116/119, - (1999), s. 65-73. ISSN 0257-8972. E-ISSN 1879-3347
Grant CEP: GA AV ČR IAA1010827
Impakt faktor: 1.008, rok: 1999
http://hdl.handle.net/11104/0030804

Počet záznamů: 1