Počet záznamů: 1
Sheet resistance of LiNbO.sub.3./sub. wafers processed in radio-ferquency plasma of hydrogen
- 1.0132737 - FZU-D 20000293 RIV CZ eng J - Článek v odborném periodiku
Turčičová, Hana - Prachařová, Jarmila - Červená, Jarmila - Vacík, Jiří
Sheet resistance of LiNbO3 wafers processed in radio-ferquency plasma of hydrogen.
Czechoslovak Journal of Physics. Roč. 50, S3 (2000), s. 461-465. ISSN 0011-4626.
[Symposium on Plasma Physics and Technology /19./. Praha, 06.06.2000-09.06.2000]
Grant CEP: GA ČR GA202/98/1285
Grant ostatní: IAEA coord. res.proj.(XX) CZR10031
Výzkumný záměr: CEZ:AV0Z1010914
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 0.298, rok: 2000
At a pressure of 0.5 torr and RF input power of 250W a surface layer of approximately 0.5 micrm on the LiNbO3 wafer was created in which the niobate structure was strongly injured. The sheet resistance was measured and reviewed a semiconducting character.
Trvalý link: http://hdl.handle.net/11104/0000584
Počet záznamů: 1