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Formation of Ti.sub.1-xSi./sub.x and Ti.sub.1-xSi./sub.xN films by magnetron co-sputtering
- 1.MUSIL, J., JANKOVCOVÁ, H., CIBULKA, V. Formation of Ti1-xSix and Ti1-xSixN films by magnetron co-sputtering. Czechoslovak Journal of Physics. 1999, 49(3), 359-372. ISSN 0011-4626.
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