Počet záznamů: 1
Characteristics of an ECR plasma sputtering source at low Ar/N2 gas pressures for thin film synthesis
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$a eng 102 $a JP 200 1-
$a Characteristics of an ECR plasma sputtering source at low Ar/N2 gas pressures for thin film synthesis 463 -1
$1 001 cav_un_epca*0256838 $1 011 $a 0021-4922 $e 1347-4065 $1 200 1 $a Japanese Journal of Applied Physics $v Roč. 36, 7B (1997), s. 4583-4587 $1 210 $c Institute of Physics Publishing 700 -1
$3 cav_un_auth*0047116 $a Shoyama $b H. $y JP $4 070 701 -1
$3 cav_un_auth*0100391 $a Mišina $b Martin $p FZU-D $4 070 $T Fyzikální ústav AV ČR, v. v. i. 701 -1
$3 cav_un_auth*0042218 $a Miyake $b S. $y JP $4 070
Počet záznamů: 1