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Surface stoichiometry and depth profile of Ti.sub.x./sub.-Cu.sub.y./sub.N.sub.z./sub. thin films deposited by magnetron sputtering

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    0552187 - FZÚ 2022 RIV CH eng J - Článek v odborném periodiku
    Mukhopadhyay, A.K. - Roy, A. - Bhattacharjee, G. - Das, S.C. - Majumdar, A. - Wulff, H. - Hippler, Rainer
    Surface stoichiometry and depth profile of Tix-CuyNz thin films deposited by magnetron sputtering.
    Materials. Roč. 14, č. 12 (2021), č. článku 3191. E-ISSN 1996-1944
    Institucionální podpora: RVO:68378271
    Klíčová slova: magnetron sputtering * Ti-Cu-N coating * N incorporation * X-ray photoelectron spectroscopy * X-ray diffraction * transmission electron microscopy
    Obor OECD: Fluids and plasma physics (including surface physics)
    Impakt faktor: 3.748, rok: 2021
    Způsob publikování: Open access

    We report the surface stoichiometry of Tix-CuyNz thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu3N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti3CuN phase.
    Trvalý link: http://hdl.handle.net/11104/0327392

     
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