In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu.sub.2./sub.O.sub.3./sub.

0546180 - FZÚ 2022 RIV DE eng J - Článek v odborném periodiku
Irimiciuc, Stefan - More Chevalier, Joris - Chertopalov, Sergii - Fekete, Ladislav - Novotný, Michal - Havlová, Šárka - Poupon, Morgane - Zikmund, Tomáš - Kůsová, Kateřina - Lančok, Ján
In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu₂O₃.
Applied Physics B-Lasers and Optics. Roč. 127, č. 10 (2021), č. článku 140. ISSN 0946-2171. E-ISSN 1432-0649
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR GA18-17834S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: expansion * dynamics * ablation * target * oxides
Obor OECD: Coating and films
Impakt faktor: 2.171, rok: 2021
Způsob publikování: Omezený přístup
https://doi.org/10.1007/s00340-021-07689-4

The control and arguably the tailoring aspect of technologies like pulsed laser deposition (PLD) rises from understanding the chemistry hidden by the laser generated plasma. With the continuous transition towards thin films with complex structures and geometries, the comprehension of the fundamental processes during the film deposition becomes critical. During the PLD of Mo and Eu-doped Lu2O3, optical emission spectroscopy was implemented for in-situ plasma monitoring. The spatial distribution of individual elements revealed the structuring of a stoichiometric plasma while the formation of LuO molecule within the plasma plume is seen as being induced by the addition of a minimum 1 Pa of O2. The energy of the ejected particles was controlled through doping and O2 pressure.
Trvalý link: http://hdl.handle.net/11104/0322752