Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering

0512095 - FZÚ 2020 RIV NL eng J - Článek v odborném periodiku
Hubička, Zdeněk - Zlámal, M. - Čada, Martin - Kment, Štěpán - Krysa, J.
Photo-electrochemical stability of copper oxide photocathodes deposited by reactive high power impulse magnetron sputtering.
Catalysis Today. Roč. 328, May (2019), s. 29-34. ISSN 0920-5861. E-ISSN 1873-4308
Grant CEP: GA ČR GA17-20008S; GA MŠMT(CZ) EF16_019/0000760
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: high power impulse magnetron sputtering * reactive sputtering * magnetron discharge * photocathode * photocurrent * copper oxide
Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.)
Impakt faktor: 5.825, rok: 2019
Způsob publikování: Omezený přístup
https://doi.org/10.1016/j.cattod.2018.11.034

Copper oxide thin films were deposited by a reactive high power impulse magnetron sputtering (r-HIPIMS) on glass substrates with a SnO2:F (FTO) layer. The pulse magnetron discharge was analyzed via the radio frequency (RF) Sobolewski probe, used for the time-resolved measurement of ion flux density on the substrate. Pulsed discharge current and voltage waveforms were analyzed.

Trvalý link: http://hdl.handle.net/11104/0302301