Time-resolved investigation of dual high power impulse magnetronsputtering with closed magnetic field during deposition of Ti–Cu thin films

0357100 - FZÚ 2011 RIV US eng J - Článek v odborném periodiku
Straňák, Vítězslav - Čada, Martin - Hubička, Zdeněk - Tichý, M. - Hippler, R.
Time-resolved investigation of dual high power impulse magnetronsputtering with closed magnetic field during deposition of Ti–Cu thin films.
Journal of Applied Physics. Roč. 108, č. 4 (2010), 043305/1-043305/8. ISSN 0021-8979. E-ISSN 1089-7550
Grant CEP: GA AV ČR KJB100100805; GA MŠMT(CZ) 1M06002; GA ČR GA202/09/0800
Grant ostatní: AV ČR(CZ) M100100915
Výzkumný záměr: CEZ:AV0Z10100522
Klíčová slova: Langmuir probes * magnetrons * metallic thin films * plasma density * sputter deposition * time resolved spectra
Kód oboru RIV: BH - Optika, masery a lasery
Impakt faktor: 2.064, rok: 2010
http://jap.aip.org/resource/1/japiau/v108/i4/p043305_s1

Time-resolved comparative study of dual magnetron sputtering (dual-MS) and dual high power impulse magnetron sputtering (dual-HiPIMS) systems arranged with closed magnetic field is presented. The dual-MS system was operated with a repetition frequency 4.65 kHz (duty cycle ≈ 50%). The frequency during dual-HiPIMS is lower as well as its duty cycle (f = 100 Hz, duty 1%). Different metallic targets (Ti, Cu) and different cathode voltages were applied to get required stoichiometry of Ti–Cu thin films. The plasma parameters of the interspace between magnetrons in the substrate position were investigated by time-resolved optical emission spectroscopy, Langmuir probe technique, and measurement of ion fluxes to the substrate. It is shown that plasma density as well as ion flux is higher about two orders of magnitude in dual-HiPIMS system. This fact is partially caused by low diffusion of ionized sputtered particles (Ti+,Cu+) which creates a preionized medium.
Trvalý link: http://hdl.handle.net/11104/0195448