0134420 - FZU-D 20030320 RIV NL eng J - Článek v odborném periodiku
Kromka, A. - Daniš, T. - Balon, D. - Janík, J. - Vaněček, Milan
Influence of nuclation parameters on growth of diamond thin films by hybrid hot filament CVD.
Diamond and Related Materials. Roč. 12, - (2003), s. 356-360. ISSN 0925-9635. E-ISSN 1879-0062
GRANT EU: European Commission(XE) HPRN-CT-1999-00139
Grant ostatní: VEGA(SK) 1/9044/02
Výzkumný záměr: CEZ:AV0Z1010914
Klíčová slova: diamond * hot filament CVD * nucleation
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.867, rok: 2003

Diamond thin films have been deposited using a modified hot filament CVD method involving a dual-plasma reactor arrangement. This new design allows ignition of d.c. plasma above and/or below hot filaments. Thus, substrate bombardement by ions could be realized in the reverse biasing at as low voltages as 50V.
Trvalý link: http://hdl.handle.net/11104/0032323