0133304 - FZU-D 20010098 RIV NL eng J - Článek v odborném periodiku
Jastrabík, Lubomír - Soukup, Ladislav - Shaginyan, L. R. - Onoprienko, A. A.
Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering.
Surface and Coatings Technology. Roč. 123, - (2000), s. 261-267. ISSN 0257-8972. E-ISSN 1879-3347
Grant CEP: GA AV ČR IAA1010827
Výzkumný záměr: CEZ:AV0Z1010914
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.002, rok: 2000

Hydrogenated carbon nitride and carbon nitride films were deposited by ECR plasma-assisted CVD and rf reactive magnetron sputtering. Film composition(N/C ratio), growth rate (Vg) and microhardness bias in the range 0 to 200V. As was revealed, the ion bombardment influences the composition and growth rate of carbon nitride films during their deposition.
Trvalý link: http://hdl.handle.net/11104/0031283