0131150 - FZU-D 960503 RIV US eng J - Článek v odborném periodiku
Muralidhar, G. K. - Musil, Jindřich - Kadlec, Stanislav
Discharge characteristics of facing target sputtering device using unbalanced magnetrons.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 14, - (1996), s. 2182-2186. ISSN 0734-2101. E-ISSN 1520-8559
Impakt faktor: 1.613, rok: 1996
Trvalý link: http://hdl.handle.net/11104/0029235