0538662 - FZÚ 2021 RIV CH eng J - Článek v odborném periodiku
Vokoun, David - Klimša, Ladislav - Vetushka, Aliaksi - Duchoň, Jan - Racek, Jan - Drahokoupil, Jan - Kopeček, Jaromír - Yu, Y.-S. - Koothan, N. - Kei, C.C.
Al₂O₃ and Pt atomic layer deposition for surface modification of NiTi shape memory films.
Coatings. Roč. 10, č. 8 (2020), s. 1-14, č. článku 746. ISSN 2079-6412. E-ISSN 2079-6412
Grant CEP: GA MŠMT(CZ) EF16_019/0000760
Grant ostatní: AV ČR(CZ) MOST-20-11; OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Program: Bilaterální spolupráce
Institucionální podpora: RVO:68378271
Klíčová slova: NiTi alloy * atomic layer deposition * thin film * Pt nanoparticles
Obor OECD: Materials engineering
Impakt faktor: 2.881, rok: 2020 ; AIS: 0.405, rok: 2020
Způsob publikování: Open access
DOI: https://doi.org/10.3390/coatings10080746

Pt coatings on NiTi films can add some useful properties, e.g., they may improve the NiTi anticorrosion and thermomechanical characteristics or activate surface properties beneficial for a specific application. Pt coatings prepared via atomic layer deposition (ALD) may help reduce cost due to the nanometric thickness. No authors have reported preparation of Pt ALD coatings on NiTi films, perhaps due to the challenge of the concurrent NiTi film oxidation during the Pt ALD process. In the present study, Al2O3 and Pt ALD coatings were applied to NiTi thin films. The ALD coating properties were studied using electron and atomic force microscopies and X-ray photoelectron spectroscopy (XPS). Potential structural changes of NiTi due to the ALD process were evaluated using electron microscopy and X-ray diffraction. The presented ALD process resulted in controllable preparation of Pt nanoparticles on ultrathin Al2O3 layer and a change of the transformation temperatures of the NiTi films
Trvalý link: http://hdl.handle.net/11104/0316416