Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge

0519384 - FZÚ 2020 RIV GB eng J - Článek v odborném periodiku
Hippler, Rainer - Čada, Martin - Straňák, V. - Hubička, Zdeněk
Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge.
Journal of Physics Communications. Roč. 3, č. 5 (2019), s. 1-9, č. článku 055011. ISSN 2399-6528
Grant CEP: GA MŠMT(CZ) EF16_019/0000760; GA ČR GA19-00579S
Grant ostatní: OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:68378271
Klíčová slova: magnetron sputtering * ion mass spectrometry * molecular ion formation * negative ions
Obor OECD: Fluids and plasma physics (including surface physics)
Způsob publikování: Open access

Formation of singly and doubly charged argon and titanium and of molecular ions in a direct current magnetron sputtering discharge with a Ti cathode and argon as working gas was investigated with the help of energy-resolved mass spectrometry. Measured ion energy distributions consist of low-energy and high-energy components resembling different formation processes.
Trvalý link: http://hdl.handle.net/11104/0304480