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Magnesium Silicide and Germanide from Wastes as a Potential Source of CVD Precursors for Catalysts Preparation.

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    0517231 - ÚCHP 2020 BG eng C - Konferenční příspěvek (zahraniční konf.)
    Bumba, Jakub - Dřínek, Vladislav - Kaštánek, František - Šolcová, Olga
    Magnesium Silicide and Germanide from Wastes as a Potential Source of CVD Precursors for Catalysts Preparation.
    Poster presentations. Sofia: Institute of Catalysis, Bulgarian Academy of Sciences, 2019, s. 1-2, č. článku O1. ISBN N.
    [National Conference on Catalysis /16./. Sofia (BG), 27.06.2019]
    Grant CEP: GA ČR GA15-14228S; GA TA ČR(CZ) TN01000048
    Institucionální podpora: RVO:67985858
    Klíčová slova: catalysts preparation * wastes * magnesium silicide and germanide
    Kód oboru RIV: CI - Průmyslová chemie a chemické inženýrství
    Obor OECD: Chemical process engineering

    Chemical vapour deposition (CVD) is a technology used for forming solid films of semiconductors, metals or alloys on a substrate from precursor in gas phase. Ultrapure semiconductors mainly of silicon, germanium, and their SiGe alloys are commonly used for production of electronic components like chips, transistors, optical parts, circuits, etc. However, a top purity is required for their application in electronic industry. Silanes (SinH2n+2), germanes (GenH2n+2) and germylsilanes (SixGeyHz) belong to common CVD precursors applied for creation the thin semiconductor layers. Regrettably, the traditional refining methods for preparation of CVD precursors from waste Si, Ge, or SiGe are energetically and technologically demanding, which is significantly reflected in their price. From that reason the newly patented process, in which waste photovoltaic panels and optical lenses served as raw materials, was tested to be the lucrative source of silicon or germanium for CVD precursors.
    Trvalý link: http://hdl.handle.net/11104/0302534
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