Počet záznamů: 1
Hydroxylation and self-assembly of colloidal hydrogenated nanodiamonds by aqueous oxygen radicals from atmospheric pressure plasma jet
- 1.0497855 - ÚFP 2019 RIV GB eng J - Článek v odborném periodiku
Jirásek, Vít - Stehlík, Š. - Štenclová, P. - Artemenko, A. - Rezek, B. - Kromka, A.
Hydroxylation and self-assembly of colloidal hydrogenated nanodiamonds by aqueous oxygen radicals from atmospheric pressure plasma jet.
RSC Advances. Roč. 8, č. 66 (2018), s. 37681-37692. E-ISSN 2046-2069
Grant CEP: GA MZd(CZ) NV15-33018A; GA ČR(CZ) GJ18-11711Y
Grant ostatní:OP VVV - SOLID21(XE) CZ.02.1.01/0.0/0.0/16_019/0000760
Institucionální podpora: RVO:61389021
Klíčová slova: surface-barrier discharge * diamond nanoparticles * detonation nanodiamonds * water * ftir * purification * reactivity
Kód oboru RIV: CB - Analytická chemie, separace
Obor OECD: Analytical chemistry
Impakt faktor: 3.049, rok: 2018
Plasma chemical surface modification of nanoparticles in gas-liquid type reactors enables a controllable, specific, low-cost, and environmentally friendly alternative to wet chemistry methods or thermal and dry plasma treatments. Here the atmospheric pressure radio-frequency microplasma jet (mu-APPJ) operating with 0.6% O-2 in He is used to deliver aqueous oxygen radicals (AOR) to the surface of similar to 3 nm hydrogenated detonation nanodiamonds (H-DNDs) suspended in water. The AOR-treated H-DND samples are characterized by FTIR and XPS spectroscopies and by AFM and SEM imaging. The main chemical reaction mechanism is identified as the abstraction of surface hydrogen atoms by O or OH radicals and a consequent attachment of the OH group, thereby increasing concentration of alcohols, carboxyls, and aldehydes on the DND's surface. FTIR spectra reveal also a structural re-arrangement of the surface water on the AOR-treated H-DNDs. Yet zeta-potential of AOR-treated H-DNDs still remains positive (decreases from +45 mV to +30 mV). The chemical modification gives rise to formation of nanoscale chain-like aggregates when AOR-treated H-DNDs are deposited on Si substrate.
Trvalý link: http://hdl.handle.net/11104/0290333
Počet záznamů: 1