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Photolithographic patterning of nanocrystalline europium-titanate Eu2Ti2O7 thin films on silicon substrates

  1. 1. 0482085 - URE-Y 2018 RIV NL eng J - Článek v odborném periodiku
    Mrázek, Jan - Boháček, Jan - Vytykáčová, Soňa - Buršík, Jiří - Puchý, V. - Robert, D. - Kašík, Ivan
    Photolithographic patterning of nanocrystalline europium-titanate Eu2Ti2O7 thin films on silicon substrates.
    Materials Letters. Roč. 209, December (2017), s. 216-219. ISSN 0167-577X
    Grant ostatní:AV ČR(CZ) SAV-16-17
    Program:Bilaterální spolupráce
    Institucionální podpora: RVO:67985882 ; RVO:68081723
    Klíčová slova: Magnetic materials * Rare earth compounds * Thin films * Photolithography
    Kód oboru RIV: BM - Fyzika pevných látek a magnetismus; BM - Fyzika pevných látek a magnetismus (UFM-A)
    Obor OECD: Condensed matter physics (including formerly solid state physics, supercond.); Condensed matter physics (including formerly solid state physics, supercond.) (UFM-A)
    Impakt faktor: 2.687, rok: 2017

    Patterned highly transparent nanocrystalline europium-titanate Eu2Ti2O7 thin films with tailored structural properties were prepared by a sol-gel approach combined with a photolithography. The amorphous thin films on silicon substrates were prepared by the sol-gel approach. Patterns were written by a photolithography process followed by wet-etching and the samples were thermally annealed forming the pure nanocrystalline phase of Eu2Ti2O7. Written patterns were crack-free and longitudinally homogenous and their lateral dimensions remained unchanged during the annealing. The lowest width of written ribs was 10 mu m. The film thickness was approximately 540 nm and the films consist of uniform nanocrystals of the size approximately 50 nm. The results can be used for preparation of patterned thin films that are suitable for a construction of integrated spintronic devices
    Trvalý link: http://hdl.handle.net/11104/0277470
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