Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration

0471563 - FZÚ 2017 RIV DE eng J - Článek v odborném periodiku
Bulíř, Jiří - Zikmund, Tomáš - Novotný, Michal - Lančok, Ján - Fekete, Ladislav - Juha, Libor
Photoluminescence excitation of lithium fluoride films by surface plasmon resonance in Kretschmann configuration.
Applied Physics A - Materials Science & Processing. Roč. 122, č. 4 (2016), s. 1-7, č. článku 412. ISSN 0947-8396. E-ISSN 1432-0630
Grant CEP: GA ČR(CZ) GAP108/11/1312; GA MŠMT(CZ) LM2011029
Institucionální podpora: RVO:68378271
Klíčová slova: local surface plasmon resonance * luminescence * XUV laser * LiF
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
Impakt faktor: 1.455, rok: 2016

We report on excitation of the photoluminescence of lithium fluoride by means of the surface plasmon resonance of Al layer. Advantage of this method is high efficiency of the excitation, which is applicable to ultrathin films. P-polarized UV diode laser light is coupled to the surface plasmon resonance using a fused silica prism in Kretschmann configuration. The angular dependence of the reflected intensity is measured using a theta-2theta goniometer. The surface plasmon at resonance condition induces photoluminescence in the adjacent lithium fluoride layer. The fluoride layers were deposited on Al-coated fused silica substrates by electron beam evaporation. For the experiment, we prepared several samples with thickness ranging from 20 to 71 nm. We studied the effect of the luminescence enhancement by the surface plasmon resonance effect. Strong quenching effect was observed in the thinnest LiF layer. Influence of X-ray irradiation on the photoluminescence was studied.
Trvalý link: http://hdl.handle.net/11104/0268939