Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering

0470666 - FZÚ 2017 RIV US eng J - Článek v odborném periodiku
Lundin, D. - Čada, Martin - Hubička, Zdeněk
Time-resolved ion flux and impedance measurements for process characterization in reactive high-power impulse magnetron sputtering.
Journal of Vacuum Science & Technology A : Vacuum, Surfaces and Films. Roč. 34, č. 4 (2016), 1-10, č. článku 041305. ISSN 0734-2101. E-ISSN 1520-8559
Grant CEP: GA ČR(CZ) GA15-00863S
GRANT EU: European Commission(XE) 608800 - HIPPOCAMP
Institucionální podpora: RVO:68378271
Klíčová slova: radiofrequency current * voltage measurements * energy-distributions * sheath voltages * deposition * density * hysteresis * discharges * films * technology
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 1.374, rok: 2016

A new planar ion flux probe, based on the Sobolewski method for time-resolved plasma characterization in inherently noisy pulsed plasma discharges, has been developed. The probe was evaluated in a high-power impulse magnetron sputtering (HiPIMS) process, which is a promising ionized physical vapor deposition technique based on pulsed plasma discharges used to engineer thin films with improved properties. Both nonreactive (pure Ar) and reactive (Ar/O-2) deposition processes were investigated using a Ti sputtering target. It was found that the process exhibited a nearly hysteresis-free and stable transition region at the chosen deposition conditions. Time-resolved measurements of the absolute ion flux impinging on the probe placed at the substrate position, as well as of the probe sheath impedance, were recorded in the metal, transition, and compound modes during the HiPIMS pulse. Gradual changes in the measured ion flux were seen when transiting from the metal mode to the compound mode.
Trvalý link: http://hdl.handle.net/11104/0268241