Scanning thermal microscopy of thermoelectric nanostructures

0470064 - FZÚ 2017 RIV US eng J - Článek v odborném periodiku
Vaniš, Jan - Zelinka, Jiří - Zeipl, Radek - Jelínek, Miroslav - Kocourek, Tomáš - Remsa, Jan - Navrátil, Jiří
Scanning thermal microscopy of thermoelectric nanostructures.
Journal of Electronic Materials. Roč. 45, č. 3 (2016), s. 1734-1739. ISSN 0361-5235. E-ISSN 1543-186X
Grant CEP: GA ČR(CZ) GA15-05864S; GA ČR(CZ) GA13-33056S
Institucionální podpora: RVO:68378271 ; RVO:61389013
Klíčová slova: thermoelectric layer * scanning thermal microscopy * pulsed laser deposition * laser deposition * secondary ion mass spectrometry
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus; CA - Anorganická chemie (UMCH-V)
Impakt faktor: 1.579, rok: 2016

We present the development and results of a new simple method for thermal conductivity characterization of thin films and thermoelectric structures using a scanning thermal microscope in pulsed current mode. The presented method does not allow measurement of absolute thermal conductivity of the studied system, but only relative to the Si substrate. We present the results of the method on the Si substrate/layer step boundary. The nano-layers of different thickness and different materials were prepared for the experiments by the pulsed laser deposition from hot-pressed targets.
Trvalý link: http://hdl.handle.net/11104/0267800