Deposition of carbon nanostructures by surfatron generated discharge

0440056 - FZÚ 2015 RIV CZ eng J - Článek v odborném periodiku
Davydova, Marina - Šmíd, Jiří - Hubička, Zdeněk - Kromka, Alexander
Deposition of carbon nanostructures by surfatron generated discharge.
Acta Polytechnica. Roč. 54, č. 6 (2014), s. 389-393. ISSN 1210-2709. E-ISSN 1805-2363
Grant CEP: GA TA ČR TA01011740; GA ČR(CZ) GP14-06054P
Institucionální podpora: RVO:68378271
Klíčová slova: carbon nanostructures * microwave plasma * PECVD * surfatron
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech

Various carbon nanostructures were deposited by surface wave discharge from an Ar/CH4/CO2 gas mixture. The type and the form of the carbon nanostructure were controlled by the gas mixture and the gas inlet. The nanostructures that formed were investigated by scanning electron microscopy and by Raman measurements. The influence of the geometrical combination of the gas inlets (via surfatrons or via the gas shower system) into the chamber is found to be a crucial deposition parameter for the controllable growth of desired carbon nanostructures.
Trvalý link: http://hdl.handle.net/11104/0243197