Počet záznamů: 1
Multi-SWD plasma jet system for PECVD deposition of thin films
- 1.0438735 - FZÚ 2015 RIV US eng J - Článek v odborném periodiku
Olejníček, Jiří - Čada, Martin - Šmíd, Jiří - Kment, Štěpán - Hubička, Zdeněk
Multi-SWD plasma jet system for PECVD deposition of thin films.
IEEE Transactions on Plasma Science. Roč. 42, č. 10 (2014), s. 2502-2503. ISSN 0093-3813. E-ISSN 1939-9375
Grant CEP: GA TA ČR TA01011740; GA MŠMT LH12045
Grant ostatní: AVČR(CZ) M100101215
Institucionální podpora: RVO:68378271
Klíčová slova: nuclear and plasma sciences * plasma applications * plasma devices * plasmas
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 1.101, rok: 2014
Multiplasma jet surface-wave discharge launched by the surfatron is a promising PECVD tool for scalable deposition of various semiconductor materials. The timeresolved Langmuir probe study revealed that the plasma plume is inhomogeneous toward the substrate. In the measured interval, the electron energy and the plasma density increased with distance from the nozzle outlet. These findings allowed us to optimize the substrate position during the deposition process.
Trvalý link: http://hdl.handle.net/11104/0242111
Počet záznamů: 1