Počet záznamů: 1  

High-rate reactive deposition of transparent SiO.sub.2./sub. films containing low amount of Zr from molten magnetron target

  1. 1. 0437497 - FZU-D 2015 RIV CH eng J - Článek v odborném periodiku
    Musil, Jindřich - Satava, V. - Baroch, P.
    High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target.
    Thin Solid Films. Roč. 519, č. 2 (2010), s. 775-777. ISSN 0040-6090
    Výzkumný záměr: CEZ:AV0Z10100520
    Klíčová slova: sputtering * evaporation * reactive deposition * target power density
    Kód oboru RIV: BM - Fyzika pevných látek a magnetismus
    Impakt faktor: 1.909, rok: 2010

    The paper reports on a reactive deposition of transparent SiO2 films with a low amount (<= 3 at.%) of Zr prepared from the molten target using the AC pulsed dual magnetron It is shown that the deposition rate a(D) of the transparent oxide film strongly increases at the critical target power density (W-t)(cr) when the solid target starts to melt and the magnetron operates with a molten target. In this case the evaporation of target material plays a dominant role in the reactive deposition of thin films This process is called the ionized magnetron evaporation Oxide films reactively deposited from the molten target are well transparent and highly elastic The maximum deposition rate of the transparent oxide film achieved in our experiments is 814 nm/min.
    Trvalý link: http://hdl.handle.net/11104/0241059