Surface wave plasma – attractive solution for industrial uses

0434339 - FZÚ 2015 RIV SK eng C - Konferenční příspěvek (zahraniční konf.)
Davydova, Marina - Šmíd, Jiří - Hubička, Zdeněk - Rezek, Ondřej - Olejníček, Jiří - Čada, Martin - Kromka, Alexander
Surface wave plasma – attractive solution for industrial uses.
Material analysis in vacuum. Bratislava: Slovenská vákuová spoločnosť, 2014 - (Michalka, M.; Vincze, A.; Veselý, M.), s. 129-133. ISBN 978-80-971179-4-8.
[School of Vacuum Technology /17./. Štrbské Pleso (SK), 02.10.2014-05.10.2014]
Grant CEP: GA TA ČR TA01011740
Institucionální podpora: RVO:68378271
Klíčová slova: surface wave plasma * cold plasma * surface treatment * diamond films
Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

This work presents the low temperature oxygen and hydrogen termination of diamond films by surface wave discharge reactor. The influence of the low temperature plasma treatment and process time on the wettability and/ or surface resistivity of the diamond films have been studied. The results indicate that a temperature as low as 250°C is sufficient to induce hydrogen-terminated conductive surface of the order of 108 Ω. An increase in substrate temperature up to 400°C results in decrease of resistivity up to 5×106 Ω.
Trvalý link: http://hdl.handle.net/11104/0238419