Počet záznamů: 1  

Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching

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    0432632 - FZÚ 2015 RIV US eng J - Článek v odborném periodiku
    Domonkos, Mária - Ižák, Tibor - Babchenko, Oleg - Varga, Marián - Hruška, Karel - Kromka, Alexander
    Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching.
    Advanced Science, Engineering and Medicine. Roč. 6, č. 7 (2014), s. 780-784. ISSN 2164-6627
    Grant CEP: GA ČR GAP108/12/0910; GA ČR GAP108/12/0996; GA MPO FR-TI2/736
    Institucionální podpora: RVO:68378271
    Klíčová slova: micro- and nanocrystalline diamond * capacitively coupled plasma * reactive ion etching * nanostructuring * scanning electron microscopy
    Kód oboru RIV: BM - Fyzika pevných látek a magnetismus

    In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containing gas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture.
    Trvalý link: http://hdl.handle.net/11104/0237011

     
     
Počet záznamů: 1  

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