ZnO thin films prepared by surfatron produced discharge

0430438 - FZÚ 2015 RIV NL eng J - Článek v odborném periodiku
Olejníček, Jiří - Šmíd, Jiří - Čada, Martin - Kment, Š. - Churpita, Olexandr - Kšírová, Petra - Brunclíková, Michaela - Adámek, Petr - Kohout, Michal - Valvoda, V. - Chvostová, Dagmar - Zlámal, M. - Hubička, Zdeněk
ZnO thin films prepared by surfatron produced discharge.
Catalysis Today. Roč. 230, Jul (2014), s. 119-124. ISSN 0920-5861. E-ISSN 1873-4308
Grant CEP: GA TA ČR TA01011740; GA MŠMT LH12045; GA ČR GAP108/12/1941; GA ČR(CZ) GAP205/11/0386
Grant ostatní: GACR(CZ) GP13-29241P
Institucionální podpora: RVO:68378271
Klíčová slova: ZnO * surfatron * thin films * Langmuir probe * plasma density
Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech
Impakt faktor: 3.893, rok: 2014

Multi plasma jet system with 4 independent nozzles working on the principle of surface-wave discharge (SWD) has been developed. The system was optimized and used for plasma-enhanced chemical vapor deposition (PECVD) of nominally pure and Al and Mn doped ZnO thin films. The surfatron source was powered by a microwave magnetron generator working at a frequency of 2.45 GHz with the output power of 300 W per surfatron. The time-resolved properties of low-pressure plasma jet working under deposition conditions in pulse mode were studied using Langmuir probe. It was found that the plasma density inside the active plasma jet is about 1017 m-3 and electron effective temperature can reach approximately 3 eV. The set of ZnO samples with a thickness of 300 nm were prepared on Si, ITO and quartz substrate and were analyzed by XRD, SEM, EDX, UV-light amperometry and optical ellipsometry. All samples under study were crystalline in nature, revealed n-type conductivity.
Trvalý link: http://hdl.handle.net/11104/0235375