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Reactive ion etching of polystyrene microspheres

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    0425611 - FZÚ 2014 RIV CZ eng K - Konferenční příspěvek (tuzemská konf.)
    Domonkos, Mária - Ižák, Tibor - Štolcová, L. - Proška, J. - Kromka, Alexander
    Reactive ion etching of polystyrene microspheres.
    Nanomateriály a nanotechnologie ve stavebnictví 2013. Praha: ČVUT, 2013 - (Nežerka, V.; Rácová, Z.; Ryparová, P.; Tesárek, P.), s. 24-28. ISBN 978-80-01-05334-8.
    [Nanomateriály a nanotechnologie ve stavebnictví 2013. Praha (CZ), 12.06.2013-12.06.2013]
    Grant CEP: GA ČR(CZ) GBP108/12/G108
    Institucionální podpora: RVO:68378271
    Klíčová slova: nanosphere lithography * reactive ion etching * polystyrene microspheres * Langmuir-Blodgett monolayers
    Kód oboru RIV: BL - Fyzika plazmatu a výboje v plynech

    This article gives a brief insight also into the principle of the nanosphere lithography and various plasma systems focusing on their properties and applicability for a subsequent topographical modification of surfaces prepared by NS lithography. In the experimental part of this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres is used as the primary template. The polystyrene microspheres (PM) were processed in capacitively coupled radiofrequency plasma (CCP) RIE system. The influence of process conditions on the PM geometry is systematically studied by scanning electron microscopy. The process conditions are controlled by varying radiofrequency power, total pressure, composition of the gas mixture (ratio O2:CF4) and process duration.
    Trvalý link: http://hdl.handle.net/11104/0231433

     
     
Počet záznamů: 1