0398973 - FZÚ 2014 RIV SK eng C - Konferenční příspěvek (zahraniční konf.)
Vojs, Marian - Michniak, P. - Řeháček, V. - Tvarožek, V. - Veselý, M. - Ižák, Tibor - Kromka, Alexander
Fabrication of nanostructured boron doped diamond films for electrochemical applications.
Progresívne materiály a vákuum ( Progressive materials and vacuum). Bratislava: Slovenská vakuová spolocnosť, 2012 - (Varga, M.; Veselý, M.; Vincze, A.), s. 53-57. ISBN 978-80-971179-0-0.
[School of Vacuum Technology /15./ ( Progressive materials and vacuum). Štrbské pleso (SK), 08.11.2012-11.11.2012]
Grant CEP: GA ČR(CZ) GBP108/12/G108
Institucionální podpora: RVO:68378271
Klíčová slova: diamond films * electrochemistry * boron doping
Kód oboru RIV: JB - Senzory, čidla, měření a regulace

In this study two different concepts for fabrication of nanostructured boron-doped diamond (BDD) electrodes are presented: concept I includes overgrowing of structured intrinsic nanodiamond film by BDD layer and concept II uses a direct etching of BDD/i-NCD double layer deposited on Si substrates by reactive ion etching (RIE). As the masking material, self-organized Au nanodroplets are used. In the present article, technological steps as growth of diamond, electrode fabrication, as well as the formation of the metal nanodroplets mask and encapsulation of diamond electrodes are discussed.
Trvalý link: http://hdl.handle.net/11104/0226386